The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 03, 1994

Filed:

Jul. 14, 1992
Applicant:
Inventors:

Mitsuhito Kamei, Hyogo, JP;

Mikio Tachibana, Hyogo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B / ; G01B / ;
U.S. Cl.
CPC ...
356371 ; 356376 ;
Abstract

A surface undulation inspection apparatus for detecting a defect of a fine undulation including a change of a gentle profile or the like on a suitable surface of a specimen to be inspected, wherein a patterning light source is opposed to an image pickup lens having a pin hole with a specimen interposed therebetween to pin-hole image pickup the patterning light source through the specimen to be inspected whereby a ray passing through the specimen to be inspected is specified as a principal ray, and a local surface undulation defect on the surface of the specimen is stressed and a defective part is specified. Further, a display pattern generated by a pattern generator is displayed on a pattern display element to used it as a patterning light source, the pattern generator is feedback controlled by a deviation calculation circuit, a standard data generator circuit, a pattern width coincidence decision circuit and a comparison data circuit, or a coordinate conversion circuit and an angle detector circuit, and an intensity of the display pattern is regularly changed in an analog manner to detect an abnormality on the basis of a differential from the image data.


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