The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 1994
Filed:
Jun. 29, 1992
Applicant:
Inventors:
Joseph G Garofalo, South Orange, NJ (US);
Christophe Pierrat, Basking Ridge, NJ (US);
Assignee:
AT&T Bell Laboratories, Murray Hill, NJ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ; G03C / ;
U.S. Cl.
CPC ...
430-5 ; 430322 ; 430323 ; 430324 ; 430313 ; 430316 ;
Abstract
A phase-shifting lithographic mask having two or more self-aligned phase-shifting regions is fabricated by a sequence of etchings of the phase-shifting mask using a protective resist layer having three or more regions that have been subjected to mutually different doses (including possibly zero) of actinic radiation-such as electron beam, ion beam, or photon beam radiation. A self-aligned opaque region can be supplied by carbonization of remaining resist material.
Garofalo, Joseph. (1994). Self-aligned method of making phase-shifting lithograhic masks having (U.S. Patent No. 5308721). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5308721
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile