The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 1994
Filed:
Sep. 12, 1991
David W Groechel, Sunnyvale, CA (US);
Masato M Toshima, Sunnyvale, CA (US);
Robert J Steger, Cupertino, CA (US);
Jerry Y Wong, Fremont, CA (US);
Tetsuya Ishikawa, Funabashi, JP;
Regga Tekeste, San Jose, CA (US);
Koichi Ito, Narita, JP;
Tetsuhiko Sambei, Tomisato, JP;
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A plasma reactor containing within the processing chamber pieces of magnetic material located to reduce and/or substantially eliminate systematic processing rate nonuniformities. These pieces are placed inside the chamber or attached inside of the pedestal adjacent to the top of the pedestal, where the wafer is to be located for processing. The thickness, shape and magnetic permeabilities of these magnetic pieces are selected to optimize process uniformity.