The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 1994
Filed:
Sep. 02, 1992
Chao-Yang Chen, Taipei, TW;
United Microelectronics Corporation, Hsinchu, TW;
Abstract
A new method of removing particles from the surface of a wafer is described. The key to the method is a room temperature ammonium hydroxide-hydrogen peroxide solution. The wafer is immersed in hydrofluoric acid, then, while the wafer is still wet, it is either immersed in an ammonium hydroxide-hydrogen peroxide solution or the ammonium hydroxide-hydrogen peroxide solution is sprayed onto the wafer. Since the cleaning solution is at room temperature, the process is safer. The bath life is prolonged because the solution does not break down as it would at higher temperatures.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile