The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 1994
Filed:
Feb. 24, 1992
Seiko Instruments Inc., , JP;
Abstract
A method of manufacturing a DC superconducting quantum interference device comprises forming an insulating film over a portion of a resistance film. A lower electrode superconducting film is formed over the resistance film and the insulating film. A barrier layer is formed on a portion of the lower electrode superconducting film. An upper electrode is formed sandwiching the barrier layer between the lower electrode superconducting film and the upper electrode, so as to form a Josephson junction. To reduce the number of manufacturing steps, the lower electrode superconducting film is photolithographically patterned and/or etched to simultaneously form an input coil, a feedback coil and the Josephson junction. In another embodiment, after forming the upper electrode, an insulating film is formed over at least a portion of the lower electrode superconducting film. A superconducting film is formed over the insulating film in contact with the upper electrode. To reduce the number of manufacturing steps, the superconducting film is photolithographically patterned and/or etched to simultaneously form a counter electrode, the input coil and the feedback coil.