The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 29, 1994

Filed:

Apr. 13, 1993
Applicant:
Inventors:

Nobutaka Kikuiri, Tokyo, JP;

Yoriyuki Ishibashi, Kanagawa, JP;

Takahiro Murata, Kanagawa, JP;

Assignee:

Kabushiki Kaisha Toshiba, Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K / ;
U.S. Cl.
CPC ...
378 34 ; 378206 ; 2504922 ;
Abstract

An exposure apparatus for a semiconductor wafer, a liquid crystal display panel and so on. The exposure apparatus comprises a light source, a holding means for a mask and a target, a moving means for moving the holding means and optical alignment systems. The optical alignment system has a moving base on which a detecting means is installed. The moving bases are arranged in the same plane and have narrow portions in their front.


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