The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 1994
Filed:
Oct. 06, 1992
Yoshinori Ohta, Tokyo, JP;
Hiroshi Kajimura, Tokyo, JP;
Akitoshi Toda, Tokyo, JP;
Tsugiko Takase, Tokyo, JP;
Olympus Optical Co., Ltd., Tokyo, JP;
Abstract
A hole is formed in a silicon substrate, passing through the substrate. An insulating film is formed on one face of the silicon substrate and one open end of the hole is thus closed by the insulating film. An antireflection film is attached to that area of the insulating film by which the one open end of the hole is closed. An optical fiber is fitted and fixed in the hole. An optically-transparent conical probe is formed on the area of the insulating film which corresponds to the hole in the silicon substrate and the probe is coated by a metal film while leaving a tip of the probe not coated. A fine aperture is thus formed at the tip of the probe to allow light to enter into the probe through the fine aperture. The metal film prevents light reflected from entering into the probe and light from being leaked from the probe, and it is connected to an electrode to use tunnel current to position the fine aperture near a sample.