The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 1994
Filed:
Jun. 24, 1993
Applicant:
Inventor:
Toshiharu Nishimura, Kofu, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B / ;
U.S. Cl.
CPC ...
134 221 ; 134 31 ; 134 37 ; 134 42 ; 156643 ; 156646 ;
Abstract
A method of cleaning a process tube and a wafer boat, comprising the steps of, carrying wafers out of the process tube, controlling the temperature in the process tube saw as or lower than a process temperature and higher than a boiling point of ClF.sub.3, said process temperature being kept in the process tube when the process of forming film on the wafers is carried out in the process tube, and supplying ClF.sub.3 -contained cleaning gas into the process tube to react the cleaning gas with the film of the silicon oxide adhering to the inner wall of the process tube and the wafer boat.