The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 1994
Filed:
Mar. 18, 1992
Applicant:
Inventor:
Hideki Gomi, Tokyo, JP;
Assignee:
NEC Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
118692 ; 118710 ; 118712 ; 118715 ; 118726 ;
Abstract
In a chemical vapor deposition apparatus in which a liquid raw material is vaporized by bubbling and the vaporized material is used as a raw material gas, an orifice is provided in a pipe between a reaction unit (a dispersion head) and a vaporizing unit (a bubbler), whereby the pressure in the vaporizing unit is controlled so that it is made higher than that in the reaction unit. Instability of the pressure in the vaporizing unit which occurs in the initial phase of film formation is eliminated so that the film formation can be stably performed.