The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 15, 1994

Filed:

Mar. 29, 1993
Applicant:
Inventors:

Michael G Ahrens, Sunnyvale, CA (US);

Douglas C Galbraith, Fremont, CA (US);

Abdelshafy Eltoukhy, San Jose, CA (US);

Assignee:

Actel Corporation, Sunnyvale, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ;
U.S. Cl.
CPC ...
257356 ; 257409 ; 257901 ;
Abstract

A semiconductor or substrate of a first conductivity type includes a well structure of a second conductivity type formed therein. A first low voltage MOS transistor includes spaced apart source and drain regions of the first conductivity type in the well. A first transistor gate lies above a channel region which is disposed between the source and drain regions of the first low voltage MOS transistor and is separated therefrom by a gate dielectric having a first thickness. A second high voltage transistor includes spaced apart source and drain regions of the first conductivity type in the well. A second transistor gate lies above a channel region which is disposed between the source and drain regions of the second high voltage transistor and is separated therefrom by a gate dielectric having a second thickness which is greater than the thickness of the gate dielectric of the first low voltage MOS transistor. A first contact diffusion, having the same conductivity type as the well, is located at the edge of the well closest to the first low voltage transistor, and is connected to a source of voltage. A second contact diffusion, having the same conductivity type as the well, is located at the edge of the well closest to the second high voltage transistor, and is also connected to the source of voltage.


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