The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 1994
Filed:
Aug. 27, 1991
Applicant:
Inventors:
Assignee:
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
4272481 ;
Abstract
In a CVD apparatus, an epitaxial apparatus or an etching apparatus, the processing conditions are made uniform in a batch process by changing, with time, positions which are disposed in the direction of a gas flow in a reaction vessel and at which the optimal surface processing conditions are attained. By doing so, homogeneous and uniform films can be formed with a large substrate processing apparatus.
Matsuda, Tetsuo. (1994). Method of processing substrates and substrate processing apparatus (U.S. Patent No. 5286523). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5286523
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