The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 1994
Filed:
Jun. 29, 1992
Applicant:
Inventors:
Ming-Yee Chiu, Princeton Junction, NJ (US);
David L Wilson, Shaker Heights, OH (US);
Assignee:
Siemens Corporate Research, Inc., Princeton, NJ (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K / ;
U.S. Cl.
CPC ...
382-6 ; 36441313 ; 378159 ; 382 22 ;
Abstract
The present invention is a method for locating an edge portion of an aperture in an X-ray filter member having at least one aperture formed therethrough, such that X-rays passing through the at least one aperture remain unattenuated and strike a subject body in a common region and wherein the X-rays passing through the filter member are attenuated and strike the subject body in a pattern that surrounds, and is adjacent to, the common region.