The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 18, 1994

Filed:

Apr. 07, 1992
Applicant:
Inventors:

Nicolas Gisin, Geneva, CH;

Patrick Stamp, Carouge, CH;

Nobuo Hori, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N / ; G01N / ;
U.S. Cl.
CPC ...
356 731 ; 356128 ; 356135 ;
Abstract

According to the present invention, there are provided a projection system for emitting luminous flux for measurement, a light receiving unit or a prism member furnished with a light receiving unit, and an optical waveguide substrate comprising a substrate portion and an optical waveguide portion formed on the substrate portion, the light receiving unit or the prism is brought into close contact with the optical waveguide substrate, luminous flux for measurement from the projection system is passed from one end of the optical wavegide portion and a part of the luminous flux for measurement is leaked toward the light receiving unit, whereby cross-sectional distribution of refractive index of the optical waveguide is measured by change of light quantity of the leaking light sensed at the light receiving unit in case an incident point of the luminous flux for measurement is moved.


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