The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 1994
Filed:
May. 20, 1992
Applicant:
Inventor:
Masahiro Yoneda, Itami, JP;
Assignee:
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
156345 ; 156643 ; 1187 / ; 20429831 ; 20429802 ;
Abstract
A fine pattern forming apparatus includes an elastic wave generating device which is provided on the wall of a vacuum chamber. A fine pattern forming method involves formation of a fine pattern while an elastic wave is being applied to the vacuum chamber by the elastic wave generating device. Since the fine pattern is formed while the elastic wave is applied to the vacuum chamber the, uniformity of the plasma density and of the electron density is improved and attachment of reaction products to the vacuum chamber is prevented.