The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 21, 1993
Filed:
Apr. 07, 1992
Samir S Shiban, Beaverton, OR (US);
Daniel G Morgan, Tigard, OR (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
A pyrophoric gas neutralization chamber is disclosed. The chamber can be used to neutralize a stream of spent process gas from, for example, a chemical vapor deposition process containing, for example, silane. The disclosed chamber is a multi-tiered structure which provides a turbulent flow of air and gas which provides for a controlled neutralization reaction. The chamber operates over a wide range of incoming pyrophoric gas flows to neutralize virtually all of the pyrophoric gas, such that the risk of explosion is eliminated. Finally, the disclosed chamber is inactive in that no fuel source, ignitors, or flame is required. The turbulence in the air/gas flow causes the pyrophoric gas to react with the air without an induced flame.