The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 30, 1993
Filed:
Nov. 26, 1991
Mikihiro Kimura, Itami, JP;
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
A flat band voltage of a MIS structure is determined by measuring high-frequency C-V characteristics thereof, and a surface potential is calculated by the definite integral processing as a function of the flat band voltage. Ideal C-V characteristics of the MIS structure are determined from the surface potential. By comparing measured low-frequency or quasi-static C-V characteristics with the ideal C-V characteristics, the distribution of an interface state density is determined. Thus, the flat band voltage of an ideal C-V curve coincides with the flat band voltage of a low-frequency or quasi-static C-V curve, so that the interface state density distribution in the MIS structure can be accurately measured.