The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 1993
Filed:
Oct. 04, 1991
Naoto Sano, Kunitachi, JP;
Tsutomu Asahina, Yokohama, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A semiconductor device manufacturing exposure method usable with a pulsed light source is disclosed. The light source is caused to produce pulses of light in accordance with successively changed control parameters, while a sensor detects each pulse of light from the light source. Outputs of the sensor corresponding to the pulses of light are integrated to determine a quantity of exposure of a predetermined zone of a substrate corresponding to each light pulse. By using the determined exposure quantities corresponding to the pulses of light, a relational equation representing the relationship between each control parameter and a corresponding exposure quantity is determined. Then, a control parameter for subsequent light pulse emission of the light source is determined in accordance with the determined relational equation.