The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 14, 1993

Filed:

Nov. 21, 1991
Applicant:
Inventors:

Hisao Hattori, Hyogo, JP;

Kenjiro Higaki, Hyogo, JP;

Hideo Itozaki, Hyogo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; C23C / ;
U.S. Cl.
CPC ...
505-1 ; 20419224 ; 505731 ; 505782 ;
Abstract

A process for preparing a single crystal thin film made of oxide superconductor of Bi, Sr, Ca, and Cu on a substrate by a sputtering method using a target made of a sintered oxide of Bi, Sr, Ca, and Cu and having its c-axis oriented in parallel with the surface of the substrate. The sputtering is effected by 90.degree. off-axis magnetron sputtering at a substrate temperature between 500.degree. C. and 750.degree. C. at a gas pressure between 0.001 Torr and 1 Torr.


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