The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 03, 1993

Filed:

Jul. 01, 1992
Applicant:
Inventors:

Clifford I Drowley, Phoenix, AZ (US);

Marco Racanelli, Phoenix, AZ (US);

Phillip H Williams, Mesa, AZ (US);

Assignee:

Motorola, Inc., Schaumburg, IL (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B / ; G01N / ;
U.S. Cl.
CPC ...
156601 ; 437-8 ; 356357 ; 356359 ; 356360 ;
Abstract

A semiconductor wafer (11) with a lattice mismatched film (12) on its upper surface is placed on a flat support surface (15). A laser beam (13, 23, 24, 26, 27) is directed onto the film (12). Curvature of the semiconductor wafer caused by the film (12) is measured simultaneously with film thickness based on characteristics of the reflected laser beam (23, 24, 26, 27). Strain within the film (12) is calculated from the curvature of the semiconductor wafer, film composition is calculated from the stress and thickness based on known properties of the film (12).


Find Patent Forward Citations

Drowley, Clifford. (1993). Simultaneously measuring thickness and composition of a film (U.S. Patent No. 5232547). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5232547

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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