The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 1993
Filed:
Mar. 28, 1991
Masaaki Yokoe, Nagoya, JP;
Yoshikazu Kurono, Aichi, JP;
Brother Kogyo Kabushiki Kaisha, Nagoya, JP;
Abstract
A stitch pattern data processing method and device for a sewing machine capable of forming a stitch pattern according to stitch pattern data including a plurality of needle location data stores stitch pattern data. It is determined whether a stitch pitch of a stitch to be formed according to each pair of adjacent ones of the plural needle location data of the stored stitch pattern data is equal to or greater than a reference pitch when contracting the stitch at a specified contraction rate in at least one direction of two perpendicular directions, sequentially from one end of the plural needle location data to another end. Needle location data of a contraction stitch pattern data is created so that when a result of the determination is negative, the needle location data nearer to another end is disregarded until the result of the determination becomes affirmative. When the determination result is affirmative, the needle location data is modified so as to define the stitch by the pair of adjacent needle location data which has not been disregarded at the contraction rate.