The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 1993
Filed:
Oct. 24, 1991
Applicant:
Inventors:
Yoshitada Oshida, Fujisawa, JP;
Genya Matsuoka, Ome, JP;
Teruo Iwasaki, Tokyo, JP;
Toshio Kaneko, Katsuta, JP;
Hiroyuki Takahashi, Yokohama, JP;
Hiroyoshi Ando, Katsuta, JP;
Hidenori Yamaguchi, Kokubunji, JP;
Katsuhiro Kawasaki, Katsuta, JP;
Assignee:
Hitachi, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; B23K / ; G01J / ; G01B / ;
U.S. Cl.
CPC ...
156626 ; 156643 ; 156345 ; 21912119 ; 21912168 ; 21912183 ; 356364 ; 356382 ; 356138 ;
Abstract
A lithographic method and a lithographic apparatus ar disclosed in which the height of a silicon wafer making up an object of lithography is accurately measured. A lithographic apparatus such as an electron beam apparatus having a height-measuring instrument built therein is effectively used for forming a pattern on the order of submicrons.