The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 27, 1993

Filed:

Aug. 31, 1990
Applicant:
Inventors:

Hans H Ammann, Chester, NJ (US);

Kwokming J Cheng, Lake Hiawatha, NJ (US);

Richard F Kovacs, Morris Plains, NJ (US);

Henry B Micks, Jr, Richmond, VA (US);

Jamey Potechin, Oak Ridge, NJ (US);

Everett Simons, Cedar Knolls, NJ (US);

Richard C Steines, Richmond, VA (US);

John G Tetz, Succasunna, NJ (US);

Assignee:

AT&T Bell Laboratories, Murray Hill, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B / ;
U.S. Cl.
CPC ...
364559 ; 382-8 ;
Abstract

A metrology system to analyze panel misregistration in a panel manufacturing process includes a software controlled system which checks defined panel parameters on the four corners of a panel and related artwork for processing with a master pattern etched on a glass reference with a machine vision measuring system. The panel or artwork being checked is positioned by panel center registration means to align the center of the panel with the center of the master pattern. Displacement and rotational differences are entered under software control into a data base and analyzed by a stored program intelligent analyses system into a plurality of parameters based on a parameter model which permits an analysis of the cause of the misregistration.


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