The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 1993
Filed:
Jan. 07, 1991
Yoshinao Kawasaki, Yamaguchi, JP;
Hironobu Kawahara, Kudamatsu, JP;
Yoshiaki Sato, Kudamatsu, JP;
Ryooji Fukuyama, Kudamatsu, JP;
Kazuo Nojiri, Higashimurayama, JP;
Yoshimi Torii, Tachikawa, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A method of processing a sample comprises etching the sample by means of an etching plasma, and then treating the sample by means of a second plasma to remove residual corrosive compounds formed by the etching plasma. Removal of the residual corrosive compounds and prevention of corrosion is much improved by contacting the surface of the sample after the second plasma treatment with at least one liquid in order to effect at least one of (a) removal of the residual corrosive compounds and (b) passivation of the surface, and drying the sample.