The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 1993
Filed:
Oct. 01, 1990
Applicant:
Inventors:
Hiromi Nishino, Kitakatsuragi, JP;
Keiji Tarui, Kitakatsuragi, JP;
Hideyuki Toyoshi, Tenri, JP;
Tatsuo Morita, Souraku, JP;
Assignee:
Sharp Kabushiki Kaisha, Osaka, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430313 ; 430 20 ; 430311 ; 430318 ; 156643 ; 1566591 ; 156660 ; 2041293 ; 20412965 ; 204131 ;
Abstract
An electrode pattern forming method comprising the steps of: forming a transparent conductive film on a substrate, covering said transparent conductive film with an aluminum film, forming a resist material film for etching on said aluminum film, exposing said resist material film followed by developing by immersing said substrate in an electrolyte to form a resist pattern, and patterning said aluminum film using said resist pattern as a mask;