The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 1993
Filed:
Dec. 09, 1991
Norio Ishibashi, Tokyo, JP;
Izumi Serizawa, Tokyo, JP;
ORC Manufacturing Company, Ltd., Tokyo, JP;
Abstract
An apparatus for photochemically decomposing a photoresist is disclosed wherein processing time can be minimized by inducing a uniform photochemical oxidative decomposing reaction over the whole surface of a base board, and an ozone gas atmosphere can be utilized efficiently. The apparatus includes a rotatable circular table supporting one or more base boards and an ashing platform arranged around the periphery of the table including an ozone feeding slit and an ozone discharge slit. The apparatus also includes a plurality of ultraviolet ray lamps arranged inside a box-shaped vessel located above the ashing platform. An upper cover plate is pivotally mounted on the ashing platform and includes a transparent window plate through which the ultraviolet rays pass to irradiate the base boards. An airtight flat space is formed between the ashing platform and the upper cover to contain the ozone atmosphere.