The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 1992
Filed:
Feb. 28, 1992
Masayuki Suzuki, Atsugi, JP;
Noritaka Mochizuki, Yokohama, JP;
Setsuo Minami, Kawasaki, JP;
Shigetaro Ogura, Tama, JP;
Yasuaki Fukuda, Machida, JP;
Yutaka Watanabe, Atsugi, JP;
Yasuo Kawai, Shizuoka, JP;
Takao Kariya, Hino, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An X-ray exposure apparatus includes a stage for holding a mask having a pattern for circuit manufacturing, a stage for holding a wafer to be exposed to the pattern of the mask with X-rays, and a reflection reduction imaging system, disposed between the mask stage and the wafer stage, including a reflecting mirror arrangement, containing at least three, but not more than five, reflecting mirrors coated with multi-layer films for receiving X-rays from the mask and directing them to the wafer to expose the wafer to the pattern of the mask with the X-ray in a reduced scale.