The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 1992
Filed:
Mar. 27, 1991
P J DeGroot, Seattle, WA (US);
Hughes Danbury Optical Systems, Inc., Danbury, CT (US);
Abstract
Optical metrology method and apparatus wherein three optical wavelengths are generated and separated into a reference beam (RB) and an object beam (OB) having substantially equal optical path lengths. After reflecting from a surface being measured OB is combined with RB and provided to sensors which measure the intensity associated with each of the wavelengths. Any difference between the intensities is indicative of a difference in the optical path lengths of OB and RB and is a function of the polarization state of each of the three returned wavelengths. Differences in optical path length are shown to be indicative of a displacement of the object being measured. Preferably, two multimode laser diodes (12,14) are provided for generating the three optical wavelengths. Two synthetic wavelengths are derived from the three optical wavelengths and are employed to improve the precision of measurement while retaining a large dynamic range made possible by the use of a large synthetic wavelength.