The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 1992
Filed:
Jan. 11, 1991
Applicant:
Inventor:
Andreas A Melas, Burlington, MA (US);
Assignee:
CVD, Inc., Woburn, MA (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ; C23C / ;
U.S. Cl.
CPC ...
4272553 ; 4272552 ; 4272551 ; 4272481 ; 427314 ; 4271263 ; 427109 ; 427166 ;
Abstract
Disclosed is a metalorganic chemical vapor deposition (MOCVD) process of depositing an indium oxide or an indium/tin oxide film on a substrate using indium alkyl etherate or indium alkyl etherate and organotin compound precursors, respectively.
Quick Actions:
Melas, Andreas. (1992). Mocvd of indium oxide and indium/tin oxide films on substrates (U.S. Patent No. 5147688). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5147688
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile