The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 1992
Filed:
Jun. 29, 1990
Applicant:
Inventors:
David R Bassett, Charleston, WV (US);
Gary A Amstutz, San Jose, CA (US);
Assignee:
OCG Microelectronic Materials, Inc., Cheshire, CT (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ; G03F / ;
U.S. Cl.
CPC ...
430169 ; 430190 ; 430191 ; 430192 ; 430193 ;
Abstract
A positive photoresist composition containing (i) a quinone diazide polymer formed by reacting a cresol-formaldehyde novolac resin and an o-quinonediazide compound, and (ii) a sulfonamide development enhancement agent.
Quick Actions:
Bassett, David. (1992). Positive photoresist composition (U.S. Patent No. 5145763). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5145763
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile