The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 1992
Filed:
Jun. 26, 1991
Applicant:
Inventor:
David Wang, Lexington, MA (US);
Assignee:
Millipore Corporation, Bedford, MA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B01D / ;
U.S. Cl.
CPC ...
210490 ; 21050035 ;
Abstract
The surface of a hydrophobic porous substrate is modified with an interpolymeric network of a hydrophilic crosslinked polymer and a crosslinked-polyamine epichlorohydrin resin having fixed positive charges. The hydrophobic substrate is contacted with a reaction system comprising a solution of (a) monomer precursor to the hydrophilic polymer, a nonionic or cationic polymerization initiator and a crosslinking agent and (b) a precursor to the crosslinked positively charged resin. The monomer is polymerized and cross-linked by free radical polymerization followed by heating the contacted substrate to form the charged resin.