The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 1992
Filed:
Dec. 27, 1990
Applicant:
Inventors:
Yigal Tomer, Jerusalem, IL;
Yigal Dafne, Jerusalem, IL;
Assignee:
Intel Corporation, Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20419212 ; 20419217 ; 2042982 ;
Abstract
A magnetron sputtering apparatus and method for achieving via step coverage symmetry in a process for depositing a metal layer over a semiconductor substrate relies upon simultaneous rotational and lateral movements of the magnetron. When the magnetron is rotated and and moved laterally at the same time, the uniformity of the magnetic field across the target is improved significantly compared to prior art magnetron sputtering systems. Simultaneous rotational and lateral movements are achieved utilizing a planetary gear system.