The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 1992
Filed:
Sep. 14, 1990
George W Turner, Chelmsford, MA (US);
Bettina A Nechay, Northboro, MA (US);
Stephen J Eglash, Concord, MA (US);
Massachusetts Institute of Technology, Cambridge, MA (US);
Abstract
Computerized acquisition and frequency-domain analysis of dynamic reflection high-energy electron diffraction (RHEED) intensity data is obtained during growth by molecular-beam epitaxy (MBE). Rapid, accurate determination of the frequency of RHEED oscillations can be obtained not only when these oscillations are well resolved, but also when the growth conditions yield oscillations that are too poorly resolved to permit frequency analysis by conventional procedures. The method has been used to study transients in the growth of AlGaAs on GaAs substrates and also to investigate the hetero-epitaxial growth of GaAs on Si.