The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 1992

Filed:

Apr. 24, 1990
Applicant:
Inventors:

Toshiya Watanabe, Kanagawa, JP;

Tetsuo Kitabayashi, Kanagawa, JP;

Assignee:

Toto Ltd., Fukuoka, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H02N / ;
U.S. Cl.
CPC ...
307130 ; 361234 ; 361235 ;
Abstract

A first voltage is first applied to the electrode or electrodes of an electrostatic chuck for electrostatically attracting a workpiece such as a silicon wafer. Then, before the workpiece is removed from the electrostatic chuck, a second voltage which is of opposite polarity to the first voltage is applied to the electrostatic chuck for eliminating a residual attractive force from the electrostatic chuck. The second voltage has a voltage value which is 1.5 to 2 times higher than the voltage value of the first voltage. The second voltage is continuously applied for a period of time which is in inverse proportion to the voltage value of the second voltage.

Published as:
CA2015383A1; EP0395340A2; KR900017265A; JPH02285980A; EP0395340A3; US5117121A; KR930006102B1; EP0395340B1; DE69009849D1; DE69009849T2; MY105566A; JP2779950B2;

Find Patent Forward Citations

Loading…