The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 1992
Filed:
Mar. 09, 1990
S Sheffield Eaton, Jr, Colorado Springs, CO (US);
Ramtron Corporation, Colorado Springs, CO (US);
Abstract
An improved DRAM memory cell uses ferroelectric material as the dielectric between capacitor plates. Preferably polycrystalline PZT or a perovskite is used for the ferroelectric, and the polar axes of the dipoles in the ferroelectric material in relaxed position are not aligned with the direction of the resulting electric field when voltage is applied to the capacitor plates. Preferably, the dipole orientation is in the plane of the ferroelectric film so that when a write voltage is removed from the capacitor plate, the dipoles tend to relax to a non-aligned position. When the cell is read or refreshed, increased charge is drawn from the bit line and resides on the capacitor plate in order to reorient the relaxed dipoles. The charge developed on the plate hence is magnified.