The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 21, 1992

Filed:

Mar. 12, 1991
Applicant:
Inventors:

William E O'Mara, Jr, Kingston, NH (US);

James D Beasom, Melbourne Village, FL (US);

Assignee:

Harris Corporation, Melbourne, FL (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
357 22 ; 357 2315 ; 357 49 ; 357 50 ;
Abstract

A MESFET including a Schottky top gate which extends across the channel region between the source and drain regions and beyond two opposed sides of the dielectric isolation onto the substrate in which the device is built. The portion of the top gate which extends across the channel is disconnected from the portion which extends across the substrate beyond the dielectric isolation. This may result from the removal of the gate material at the dielectric isolation or by the portion of the gate material which is on the dielectric isolation being vertically displaced and disconnected or discontinous from the portion of the gate material which extends across the channel and that portion which extends across the substrate.


Find Patent Forward Citations

O'Mara, Jr, William. (1992). Method of isolating a top gate of a mesfet and the resulting device (U.S. Patent No. 5107312). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5107312

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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