The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 1992
Filed:
Jun. 08, 1990
Hitachi, Ltd., Tokyo, JP;
Hitachi VLSI Engineering Corp., Kodaira, JP;
Hitachi Tokyo Electronics Co., Ltd., Ohme, JP;
Abstract
A processing apparatus includes a processing chamber and an insertion jig for inserting an object to be processed into the processing chamber. The processing chamber and the insertion jig are adapted to be individually movable relative to a heating section, so that the operation of loading and unloading the object into and from the processing chamber effected by the insertion jig is conducted outside the heating section, thereby preventing the outside air from being induced to enter the heated processing chamber, together with the object of the processing, and thus avoiding the occurrence of various problems, for example, the object of processing being disorderly oxidized by the oxygen contained in the outside air, and the foreign matter contained in the outside air being undesirably attached to the surface of the object, so as to obtain excellent processing results. Further, the insertion jig, which is adapted to insert an object to be processed into the processing chamber through an opening provided therein, is provided with an auxiliary tube which is movable relative to the insertion jig in the direction of movement of the jig and which is detachably connected to the opening of the processing chamber, thereby preventing the outside air from being induced to enter the heated processing chamber, together with the object of processing, and thus avoiding various problems, e.g., the object of processing being undesirably oxidized by the oxygen contained in the outside air, and the foreign matter contained in the outside air being attached to the surface of the object of processing. In consequence, it is possible to obtain excellent processing results.