The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 1992
Filed:
Mar. 17, 1989
Shunpei Yamazaki, Tokyo, JP;
Shinji Imatou, Atsugi, JP;
Noriya Ishida, Atsugi, JP;
Mari Sasaki, Atsugi, JP;
Mitsunori Sakama, Hiratsuka, JP;
Takeshi Fukada, Ebina, JP;
Naoki Hirose, Atsugi, JP;
Mitsunori Tsuchiya, Atsugi, JP;
Atsushi Kawano, Atsugi, JP;
Kazuhisa Nakashita, Atsugi, JP;
Junichi Takeyama, Atsugi, JP;
Toshiji Hamatani, Atsugi, JP;
Semiconductor Energy Laboratory Co., Ltd., Kanagawa, JP;
Abstract
An improved apparatus and method for depositing thin films on a substrate. The apparatus utilizes two types of energy input. A pair of electrodes are provided in a reaction chamber and supplied with first AC electric energy at 1 to 100 MHz for generating a plasma gas in a reaction chamber therebetween. The substrate is mounted on a substrate holder to which second electric energy is supplied.