The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 24, 1991
Filed:
Oct. 03, 1990
Applicant:
Inventors:
Hitoshi Tamura, Yokohama, JP;
Tamotsu Shimizu, Yokohama, JP;
Assignee:
Hitachi, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ; C23C / ;
U.S. Cl.
CPC ...
20429811 ; 20429816 ; 118723 ;
Abstract
A film forming apparatus comprises of a microwave generating device and processing chamber. The processing chamber has a substrate therein, holds the pressure of atmosphere gas therein at a predetermined value, and generates plasma while introducing the microwave generated by the microwave generating device for forming a film on the substrate. The microwave is introduced in the processing chamber through a dielectric member disposed in the processing chamber. Further a shielding member is disposed in the processing chamber so as to be opposite to the dielectric member for preventing the attachment of film forming material to the dielectric member.