The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 1991
Filed:
Sep. 19, 1989
Imad Mahawili, Sunnyvale, CA (US);
Watkins-Johnson Company, Palo Alto, CA (US);
Abstract
A heater assembly and method of operation for use in processing of a substrate such as a semiconductor wafer, for example in a chemical vapor deposition (CVD) reactor chamber, the heater assembly including a dielectric heater base, radially spaced apart and circumferentially extending heater element segments being arranged on the heater base, operation of the plurality of heater elements being independently regulated, a heater shroud being arranged in spaced apart relation over the heater elements while supporting the substrate for maintaining a blanket of inert gas between the heater elements and the heater shroud. Inert gas is preferably introduced through a central opening in the heater base and is selectively regulated for facilitating processing of the substrate.