The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 1991
Filed:
Dec. 12, 1990
A N Choudhury, West Newton, MA (US);
Chirravuri Jagannath, Medfield, MA (US);
Boris S Elman, Newton, MA (US);
Craig A Armiento, Acton, MA (US);
GTE Laboratories Incorporated, Waltham, MA (US);
Abstract
An IMSM photodetector structure comprises a GaAs substrate, a buffer region grown on the substrate, an optically active absorbing layer of In.sub.0.42 Ga.sub.0.58 As grown on the absorbing layer. The buffer region includes in sequence a first layer of In.sub.0.23 Ga.sub.0.77 As, an In.sub.0.46 Ga.sub.0.54 As/GaAs superlattice, and a second layer of In.sub.0.23 Ga.sub.0.77 As. An interdigitated pattern of Schottky metal contacts is fabricated on the Al.sub.0.3 Ga.sub.0.7 As/GaAs superlattice. This structure is useful in fabricating long-wavelength, monolithic receivers based on GaAs MESFET technology since the optical and electrical characteristics of the structure are preserved during the thermal annealing cycle necesary in ion-implaned GaAs MESFET processes.