The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 17, 1991

Filed:

Apr. 20, 1990
Applicant:
Inventors:

John Aiton, Boise, ID (US);

Patrick W Vaughn, Caldwell, ID (US);

Eugene DeLarosa, Boise, ID (US);

Assignee:

Micron Technology, Inc., Boise, ID (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B / ;
U.S. Cl.
CPC ...
355 53 ; 355 77 ;
Abstract

A reticle for use in a wafer stepper of the type in which a lens projects the image of a mask to create a lithographically-defined pattern on a wafer. The reticle includes a plurality of parallel, opaque rectangles formed therein. The rectangles are uniform in size with the width of each rectangle bearing a ratio to the distance between adjacent rectangles of approximately 4:1.


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