The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 1991
Filed:
Jun. 05, 1990
Richard K Cole, III, Stoughton, WI (US);
Franco Cerrina, Madison, WI (US);
Wisconsin Alumni Research Foundation, Madison, WI (US);
Abstract
A beamline for X-ray lithography receives a fan of synchrotron radiation with a first mirror which has a concave/concave (toroidal) shape. This mirror collects the fan of X-rays and partially collimates the beam horizontally. The beam is then intercepted by a second refocusing mirror which has a saddle toroidal shape with a major concave radius of curvature and a minor convex radius of curvature. The refocusing mirror acts to collimate the X-rays horizontally and to focus the X-rays vertically. A third flat mirror may be interposed in the beam reflected from the second mirror and can pivot to change the angle of incidence to cause the beam to scan across the image plane. The two toroidal mirrors preferably have approximately a 2 degree grazing angle of incidence of the beam. The two toroidal mirrors act together to provide a very uniform image with a uniform power distribution in the beam. The beamline provides X-rays that are well matched to the mask and photo-resist requirements of X-ray lithography, in that X-rays above and below the desired process window of X-ray energies are substantially attenuated.