The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 1991
Filed:
Apr. 24, 1990
Applicant:
Inventor:
Navjot Chhabra, Boise, ID (US);
Assignee:
Micron Technology, Inc., Boise, ID (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F24J / ;
U.S. Cl.
CPC ...
432226 ; 432249 ; 432253 ; 432 17 ;
Abstract
Disclosed is a semiconductor processing furnace flow restricting apparatus for insertion into a longitudinally elongated semiconductor wafer processing furnace to create back pressure to increase residence time of processing gases within the furnace. The apparatus comprises: