The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 1991
Filed:
Apr. 16, 1987
Hideo Hosoya, Tokyo, JP;
Masayuki Kimura, Tokyo, JP;
Hiroshi Endo, Tokyo, JP;
Yoshio Hiraki, Tokyo, JP;
Shoji Yamamoto, Tokyo, JP;
Satoshi Yoshikawa, Tokyo, JP;
Hidetaka Omine, Tokyo, JP;
Koji Miyazaki, Tokyo, JP;
Kabushiki Kaisha Yakult Honsha, Tokyo, JP;
Abstract
Hyaluronic acid can be produced efficiently and economically by culturing a strain belonging to a Streptococcus, which has hyaluronic acid producing ability, is hyaluronidase-nonproductive and shows anhemolytic property, and then collecting the hyaluronic acid from the resultant culture. The strain may preferably be Streptococcus zooepidemicus, especially, Streptococcus zooepidemicus YIT 2030 (FERM BP-1305). The hyaluronic acid has a high molecular weight and is useful in providing a cosmetic composition having excellent moisturizing effects and superb feeling of application.