The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 1991
Filed:
Oct. 20, 1988
Applicant:
Inventors:
Thomas B Okarma, Palo Alto, CA (US);
Chin-Hai Chang, Los Altos, CA (US);
Brian R Clark, Redwood City, CA (US);
L Bernard Lerch, Menlo Park, CA (US);
Assignee:
Applied ImmuneSciences, Menlo Park, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D / ;
U.S. Cl.
CPC ...
21032184 ; 21032186 ; 2105021 ; 210908 ; 435287 ; 436178 ; 502404 ; 530412 ; 530814 ;
Abstract
Compositions and devices are provided for the specific removal of components of plasma in efficient and economical ways. The devices provide for a tortuous path of the plasma through a high surface material to which is bound a binding compound for removal of the fluid component. The devices find particular application with plasma, in diagnosis, therapy, and for production of specific physiologically active materials.