The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 1991
Filed:
Jan. 30, 1990
Applicant:
Inventors:
Howard S Kurasaki, San Jose, CA (US);
Barbara F Westlund, Saratoga, CA (US);
James E Nulty, San Jose, CA (US);
E John Vowles, Deering, NH (US);
Assignee:
General Signal Corporation, Stamford, CT (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; B44C / ; C03C / ; C03C / ;
U.S. Cl.
CPC ...
156643 ; 156644 ; 156646 ; 156651 ; 156653 ; 156657 ; 156663 ; 156345 ; 20419237 ; 20429834 ; 252 791 ;
Abstract
A two-step process for forming champagne profiles on semiconductor wafers that provide, when metallized, good reliability, microcracking-free contacts and vias is disclosed. Dry etch apparatus having electrodes in a triode configuration, two plasma forming regions, and a pressure control system operative to provide a wide setpoint pressure range is also disclosed.
Kurasaki, Howard. (1991). Dry etch process for forming champagne profiles, and dry etch apparatus (U.S. Patent No. 5013400). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5013400
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile