The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 1991
Filed:
Jul. 13, 1990
Wadie N Khadder, Santa Clara County, CA (US);
James P Vokac, Santa Clara County, CA (US);
Robert C Dobkin, Santa Clara County, CA (US);
Linear Technology Corporation, Milpitas, CA (US);
Abstract
A high speed BIFET junction field effect transistor is formed in an epitaxial layer of one conductivity type and includes source and drain regions of opposite conductivity type interconnected by a thin channel region of the opposite conductivity type. A thin surface layer of the one conductivity type is formed over the channel region, and a highly conductive contact is formed on the surface layer intermediate the source and drain regions. The surface contact can comprise highly doped polycrystalline silicon material with a metal layer on the surface thereof. The surface contact and the epitaxial layer underlying the channel region comprise gates for the field effect transistor. Increased speed of operation comes from the increased conductivity of the surface contact.