The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 1991
Filed:
Jul. 11, 1989
Hitachi, Ltd., Tokyo, JP;
Abstract
A charged particle beam apparatus comprising a charged particle beam source(s) for generating an ion beam and an electron beam, a focusing lens system for finely focusing each of the generated ion beam and electron beam, a charged particle beam deflecting system for deflecting each of the focused ion beam and electron beam, and a specimen subjected to irradiation thereof with each of the focused ion beam and electron beam is provided with means for detecting the deviation of the irradiation positions of the ion beam and the electron beam on the specimen from each other and means for making the irradiation positions of the ion beam and the electron beam on the specimen coincident with each other on the basis of the result of detection of the deviation of the irradiation positions from each other.