The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 1991
Filed:
May. 17, 1989
Applicant:
Inventors:
Assignee:
Siemens Aktiengesellschaft, Berlin and Munich, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ; 430323 ; 430324 ; 2505051 ; 2504923 ;
Abstract
A method for manufacturing a control plate for a lithographic device. The control plate manufactured with a method of the present invention is essentially composed of a semiconductor substrate having an opening for the passage of particle probes emanating from a multi-beam source and of a corresponding plurality of deflection elements that are connected via bond pads and connecting lines to the electronics of the lithographic device that generates control signals. Lithographic methods and voltaic shaping techniques are utilized for the manufacture of the deflection elements located on the semiconductor substrate which is coated with a dielectric.