The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 1991
Filed:
May. 23, 1989
Applicant:
Inventors:
Rhett B Jucha, Celeste, TX (US);
Cecil J Davis, Greenville, TX (US);
Steve S Huang, Dallas, TX (US);
Lee M Loewenstein, Plano, TX (US);
Jeff D Achenbach, Rowlett, TX (US);
Assignee:
Texas Instruments Incorporated, Dallas, TX (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ; B44C / ; C03C / ;
U.S. Cl.
CPC ...
437225 ; 437228 ; 437235 ; 437238 ; 148D / ; 156643 ; 156653 ; 427 38 ; 427 39 ;
Abstract
An apparatus and a method for the etching of semiconductor materials is disclosed. The apparatus includes a process chamber which includes a plasma generator remote from and in fluid communication with the process chamber. The remote plasma generator includes an inlet tube, a discharge tube in fluid communication with the inlet tube, an excitation cavity surrounding the discharge tube, an outlet tube in fluid communication with the discharge tube and a process chamber, and an injection tube in the outlet tube.